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Real-time visualization of domain formation in periodically poled lithium niobate

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Abstract

We present video footage demonstrating real-time visualization of domain formation in periodically-poled lithium niobate (PPLN). This in-situ, non-destructive technique provides important visual information concerning the global quality and dynamics of domain patterning during the fabrication of PPLN.

©2000 Optical Society of America

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Supplementary Material (6)

Media 1: MOV (2449 KB)     
Media 2: MOV (2453 KB)     
Media 3: MOV (2611 KB)     
Media 4: MOV (1686 KB)     
Media 5: MOV (1176 KB)     
Media 6: MOV (2019 KB)     

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Figures (9)

Fig. 1.
Fig. 1. Microscopic view of a sample of periodically poled lithium niobate (top left) through crossed polarizers before being etched in HF acid and (top right) without polarizers after being etched with HF acid. (Bottom) Expanded view of the sample after being etched in HF acid.
Fig. 2.
Fig. 2. Diagram of the electric-field poling setup. Series resistor Rs=100 MΩ, voltage monitor resistors R1=1000 MΩ R2=333 kΩ.
Fig. 3.
Fig. 3. Electric-field poling setup and domain formation visualization equipment.
Fig. 4.
Fig. 4. (2.45 MB) Movie of domain formation in a PPLN single-grating full-wafer.
Fig. 5.
Fig. 5. (2.45 MB) Movie of domain formation in a multi-grating PPLN sample.
Fig. 6.
Fig. 6. (Left, 2.61 MB) Movie of domain formation in a PPLN full-wafer with unpoled triangular and trapezoidal sections. (Right, 1.69 MB) Movie of domain formation in a PPLN full-wafer with three fan gratings.
Fig. 7.
Fig. 7. (1.17 Mb) Movie of domain formation in a PPLN full-wafer with multi-gratings sections.
Fig. 8.
Fig. 8. (2.0 Mb) Movie of domain formation in an overpoled multi-grating PPLN sample.
Fig. 9.
Fig. 9. Microscopic view of the overpoled sample of periodically poled lithium niobate of Fig. 8 (top left) through crossed polarizers before being etched in HF acid and (top right) without polarizers after being etched with HF acid. (Bottom) Expanded view of the sample after being etched in HF acid.
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