Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Energy flow in light-coupling masks for lensless optical lithography

Open Access Open Access

Abstract

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.

©1998 Optical Society of America

Full Article  |  PDF Article
More Like This
Symmetrical 1×2 digital photonic splitting switch with low electrical power consumption in SiGe waveguides

Baojun Li, Yao Zhang, Lihua Teng, Yuzhou Zhao, Soo-Jin Chua, and Xiangrong Wang
Opt. Express 13(2) 654-659 (2005)

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Andreas Vetter, Raoul Kirner, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, and Reinhard Voelkel
Opt. Express 26(17) 22218-22233 (2018)

Redistributing the energy flow of a tightly focused radially polarized optical field by designing phase masks

Zhongsheng Man, Zhidong Bai, Shuoshuo Zhang, Xiaoyu Li, Jinjian Li, Xiaolu Ge, Yuquan Zhang, and Shenggui Fu
Opt. Express 26(18) 23935-23944 (2018)

Supplementary Material (4)

Media 1: MOV (1602 KB)     
Media 2: MOV (1308 KB)     
Media 3: MOV (1412 KB)     
Media 4: MOV (1499 KB)     

Cited By

Optica participates in Crossref's Cited-By Linking service. Citing articles from Optica Publishing Group journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (5)

Fig. 1.
Fig. 1. Schematic view of a light-coupling mask (LCM) and its operation. The areas to be exposed in the photoresist correspond to protrusions on the mask surface, to which the light is guided. A thin gold layer can be deposited on the noncontacting portions of the mask to enhance the contrast.
Fig. 2.
Fig. 2. Light propagation through an LCM defined only by air gaps. The width of the protrusion is 100 nm and its height 60 nm. The figure shows the field intensity map and the Quicktime movie an animation of the field propagation in the structure (evolution of the electric field amplitude as a function of time; each frame represents a 10° change in the phase of the field). The arrows represent the time-averaged Poynting vector. [Media 1]
Fig. 3.
Fig. 3. Contribution of a 10-nm-thick gold layer to the light propagation in an LCM. The figure shows the field intensity map and the Quicktime movie an animation of the field propagation in the structure (evolution of the electric field amplitude as a function of time; each frame represents a 10° change in the phase of the field). The arrows represent the time-averaged Poynting vector. [Media 2]
Fig. 4.
Fig. 4. Same situation as in Fig. 3, but for a 60-nm-thick gold layer. [Media 3]
Fig. 5.
Fig. 5. Light propagation through an LCM where the protrusion is defined by a 60-nm-thick air gap with a 10-nm gold metal layer. The figure shows the field intensity map and the Quicktime movie an animation of the field propagation in the structure (evolution of the electric field amplitude as a function of time; each frame represents a 10° change in the phase of the field). The arrows represent the time-averaged Poynting vector. [Media 4]
Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved