Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Journal Home About Issues in Progress Current Issue All Issues Feature Issues

65 nm feature sizes using visible wavelength 3-D multiphoton lithography

Wojciech Haske, Vincent W. Chen, Joel M. Hales, Wenting Dong, Stephen Barlow, Seth R. Marder, and Joseph W. Perry

Open Access Open Access

Abstract

Nanoscale features as small as 65 ± 5 nm have been formed reproducibly by using 520 nm femtosecond pulsed excitation of a 4,4’-bis(di-n-butylamino)biphenyl chromophore to initiate crosslinking in a triacrylate blend. Dosimetry studies of the photoinduced polymerization were performed on chromophores with sizable two-photon absorption cross-sections at 520 and 730 nm. These studies show that sub-diffraction limited line widths are obtained in both cases with the lines written at 520 nm being smaller. Three-dimensional multiphoton lithography at 520 nm has been used to fabricate polymeric woodpile photonic crystal structures that show stop bands in the near-infrared spectral region.

©2007 Optical Society of America

Full Article  |  PDF Article
More Like This
120 nm resolution and 55 nm structure size in STED-lithography

Richard Wollhofen, Julia Katzmann, Calin Hrelescu, Jaroslaw Jacak, and Thomas A. Klar
Opt. Express 21(9) 10831-10840 (2013)

Polymerized nanotips via two-photon photopolymerization

Fengjie Qi, Yan Li, Dengfeng Tan, Hong Yang, and Qihuang Gong
Opt. Express 15(3) 971-976 (2007)

Engineering stop gaps of inorganic-organic polymeric 3D woodpile photonic crystals with post-thermal treatment

Jiafang Li, Baohua Jia, and Min Gu
Opt. Express 16(24) 20073-20080 (2008)

View More...

Cited By

Optica participates in Crossref's Cited-By Linking service. Citing articles from Optica Publishing Group journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (8)
Fig. 1.
Fig. 1. Molecular structures of photoinitiators used in this work, DABP (left) and DABSB (right).

Download Full Size | PDF

Fig. 2.
Fig. 2. Schematic illustrations of both types of support structures used for dosimetry studies: (a) rectangular solid walls and (b) rectangular “stack of logs” structure.

Download Full Size | PDF

Fig. 3.
Fig. 3. SEM overview images of lines fabricated at threshold powers with (a) 730 nm excitation using DABSB-triacrylate resin and with (b) 520 nm excitation using DABP-triacrylate resin. Aerial views of support structures described in Fig. 2 are clearly visible in each image. Magnified images of a single line are shown below their respective overview images.

Download Full Size | PDF

Fig. 4.
Fig. 4. Dosimetry studies on lines fabricated with 730 nm excitation using DABSB-triacrylate resin. Measured (a) line widths and (b) calculated voxel volumes (see text) as a function of inverse scan speed for different excitation powers. Error bars are given by standard deviations of experimentally measured line widths. The solid lines in (a) are guides for the eye whereas in (b) they represent fittings according to Eq. (1) as described in the text.

Download Full Size | PDF

Fig. 5.
Fig. 5. Polymer growth rates (as determined in text) derived from the dosimetry studies shown in Fig. 4(b) as a function of excitation power. The experimentally determined values are given as filled black squares and the red solid line indicates a fitting according to Eq. 2. The fitting parameters are: C = 1770, P th = 0.66, and N = 3.14.

Download Full Size | PDF

Fig. 6.
Fig. 6. Dosimetry studies on lines fabricated with 520 nm excitation using the DABP-triacrylate resin. Error bars are given by standard deviations of experimentally measured line widths. The solid lines are guides for the eye.

Download Full Size | PDF

Fig. 7.
Fig. 7. SEM overview images of woodpile-type PC structures fabricated with 520 nm excitation at (a) 0.60 μW and at (b) 0.45 μW using the DABP-triacrylate resin. Fabrication parameters of PCs were: lateral line-to-line spacings of (a) 0.85 μm and (b) 0.5 μ m, axial layer-to-layer spacings of ~0.34 μ m, and scan speeds of 60 μm/sec. Magnified images of the PC structures are shown below their respective overview images.

Download Full Size | PDF

Fig. 8.
Fig. 8. Transmission spectra of PBG structure fabricated with 520 nm excitation at 0.60 μW using the DABP-triacrylate resin. The dotted lines indicate experimentally observed spectra while the solid lines are merely guides for the eye. Observed stop bands have been indicated by appropriately colored arrows. Fabrication parameters of PBG were: average line width of 75 nm, lateral line-to-line spacing of 0.5 μ m, axial layer-to-layer spacing of ~0.34 μ m, scan speed of 60 μm/sec.

Download Full Size | PDF

Equations (2)

Equations on this page are rendered with MathJax. Learn more.

V = A [ 1 − exp ( − B∙t ) ]
R p = C∙ ∣ P − P th ∣ N 2 ,
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use