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Nonlinear refractive index of fs-laser-written waveguides in fused silica

Dominik Blömer, Alexander Szameit, Felix Dreisow, Thomas Schreiber, Stefan Nolte, and Andreas Tünnermann

Open Access Open Access

Abstract

We report on the measurement of the nonlinear refractive index of fs-laser written waveguides in fused silica by analyzing self-phase modulation of the propagating light. The nonlinear index is reduced considerably compared to the bulk material by the writing process and is furthermore highly dependant on processing parameters.

©2006 Optical Society of America

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Figures (5)
Fig. 1.
Fig. 1. Schematic of the writing process in transparent bulk material using fs-laser pulses

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Fig. 2.
Fig. 2. (a) Near-field profile at λ=800 nm for a waveguide written at 500 μm/s and (b) corresponding refractive index profile

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Fig. 3.
Fig. 3. Dependence of (a) the refractive index change and (b) the waveguide losses on the writing velocity

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Fig. 4.
Fig. 4. Comparison between measured (a), (c) and (e) and corresponding simulated (b), (d) and (f) spectra after propagation through a waveguide

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Fig. 5.
Fig. 5. Dependence of the nonlinear refractive index on writing velocity

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Equations (4)

Equations on this page are rendered with MathJax. Learn more.

n 2 x y = n eff 2 − λ 2 4 π 2 Δ A x y A x y
∂ A ∂ z + α 2 A + i β 2 2 ∂ 2 A ∂ T 2 = i γ ( ∣ A ∣ 2 A + i ω ∂ ∂ T ( ∣ A ∣ 2 A ) − T R A ∂ ∣ A ∣ 2 ∂ T ) .
γ = ω c n 2 A eff ,
n 2 eff = ∫ ∫ dxdyI x y n 2 x y ∫ ∫ dxdyI x y ,
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