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Optical properties of waveguides written by a 26 MHz stretched cavity Ti:sapphire femtosecond oscillator

R. Osellame, N. Chiodo, V. Maselli, A. Yin, M. Zavelani-Rossi, G. Cerullo, P. Laporta, L. Aiello, S. De Nicola, P. Ferraro, A. Finizio, and G. Pierattini

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Abstract

We report on the fabrication, by a 26 MHz stretched-cavity femtosecond Ti:sapphire oscillator, of optical waveguides in different glass substrates, and their optical characterization. Operation of these waveguides in the telecom range at 1.55 µm is demonstrated. Digital holography microscopy is used to measure their refractive index profile. The results evidence a strong dependence of the fabrication process on the glass matrix. ©2005 Optical Society of America

©2005 Optical Society of America

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Figures (8)
Fig. 1.
Fig. 1. Experimental setup for optical waveguide writing.

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Fig. 2.
Fig. 2. (a) dots: autocorrelation of the pulse in the focus of the 100× objective without any precompression; solid line fit by a sech2 pulse obtained by adding to the pulse spectrum a group delay dispersion (GDD) of 2500 fs2; (b) dots: autocorrelation of the pulse with pre-compression; solid line: fit by a pulse with residual GDD of ±200 fs2.

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Fig. 3.
Fig. 3. Experimental set-up of DHM; PBS: polarizing beam-splitter; M: mirror; MO: microscope objective; BS: beam-splitter; PH: pin-hole; d: reconstruction distance; S: sample.

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Fig. 4.
Fig. 4. DIC images from above of waveguides written in different glass substrates. Insets show cross sections of the end faces. Pulse energy and writing speed: 15 nJ and 1 mm/s for fused silica; 13 nJ and 2 mm/s for phosphate glass; 10 nJ and 1 mm/s for IOG10; 13 nJ and 7 mm/s for 0211.

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Fig. 5.
Fig. 5. Refractive index profile by DHM of a waveguide written in Schott IOG10 glass.

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Fig. 6.
Fig. 6. Refractive index profile by DHM of a waveguide written in Corning 0211 glass.

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Fig. 7.
Fig. 7. Left: experimental near field mode profile at 1.55 µm of a waveguide fabricated in Schott IOG10 glass; right: simulated near field based on the refractive index profile of Fig. 5.

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Fig. 8.
Fig. 8. Left: experimental near field mode profile at 1.55 µm of a waveguide fabricated in Corning 0211 glass; right: simulated near field based on the refractive index profile of Fig. 6.

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