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Compact low loss single air interface bends in polymer waveguides

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Abstract

We report the design, fabrication, and measurement of high efficiency, compact 45° single air interface bends in low refractive index contrast waveguides in a low refractive index material system. Using standard microfabrication techniques, the bends are fabricated on silicon substrates using perfluorcyclobutyl (PFCB) copolymers, which feature a high glass transition temperature and low absorption loss. The measured 45° bends have a loss of 0.30±0.03dB/bend for TM polarization and 0.33±0.03dB/bend for TE polarization.

©2004 Optical Society of America

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Figures (11)

Fig. 1.
Fig. 1. Top view of SAIB structure for a 45° waveguide bend showing the air interface placement and choice of reference point for design.
Fig. 2.
Fig. 2. Magnitude squared time averaged (a) magnetic field plot (TE polarization) and (b) electric field plot (TM polarization) at λ=1.55µm.
Fig. 3.
Fig. 3. (a) Bend efficiency as a function of the position of the air interface relative to the O position. The designed position of the SAIB is zp=-0.2µm. Note that the vertical axis starts at a bend efficiency of 0.5.
Fig. 4.
Fig. 4. (a) Cross-section SEM image showing the typical etch undercut (1.1µm as depicted by the cursor width) for an air trench.
Fig. 5.
Fig. 5. Microscope image taken with a DIC filter through a 50x objective focused at the waveguide plane of SAIBs in good alignment.
Fig. 6.
Fig. 6. SEM image of finished air trench bend. The rounded edges are introduced to reduce stress. The dotted line depicts the waveguide core location.
Fig. 7.
Fig. 7. SEM image of a typical sidewall for the deep anisotropic air trench etch.
Fig. 8.
Fig. 8. SEM image of a typical air trench sidewall.
Fig. 9.
Fig. 9. (a) Output power as a function of moving the output fiber away from the waveguide. (b) Standard deviation for measured output power in ten different measurements.
Fig. 10.
Fig. 10. Measurement data for a waveguide group that shows a bend efficiency of 93.4% with error bars indicating the variability introduced by measurement uncertainty. This waveguide group has an undercut compensation of 1.1µm.
Fig. 11.
Fig. 11. Simulation and measurement data as a function of SAIB interface misplacement. The horizontal axis is the actual offset introduced into the SAIB mask to compensate for misalignment.
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