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Single-step photopatterning of diffraction gratings in highly photosensitive hybrid sol-gel films

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Abstract

Inorganic-organic hybrid materials prepared by a sol-gel process showed a large photoinduced negative refractive-index change (2×10-2) and a volume change. Diffraction gratings were made directly by irradiation with a KrF excimer laser (248 nm) through a phase mask without any etching process. The dependence of diffraction efficiency on irradiation conditions was investigated. The maximum diffraction efficiency, measured by the Littrow configuration with a He-Ne laser (633 nm), was 3.4% in reflection mode.

©2003 Optical Society of America

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Figures (4)

Fig. 1.
Fig. 1. Changes in refractive index and film thickness versus irradiation time by a KrF excimer laser at room temperature and an ambient atmosphere.
Fig. 2.
Fig. 2. (a) Illustration of the system of an excimer laser and (b) the schematic illustration of the interference beam diffracted by a phase mask.
Fig. 3.
Fig. 3. Perspective SEM view of a 0.5 µm grating printed upon an inorganic-organic hybrid gel film.
Fig. 4.
Fig. 4. Relation between the diffraction efficiency and the irradiation time of a KrF excimer laser.
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